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Metal Organic Chemical Vapor Deposition (MOCVD) Cylinder Gas Tungsten Hexafluoride

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Metal Organic Chemical Vapor Deposition (MOCVD) Cylinder Gas Tungsten Hexafluoride

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Brand Name :CMC
Model Number :Wf6
Certification :COA
Place of Origin :China
MOQ :1 Piece
Price :US $ 15/PC
Payment Terms :L/C, T/T
Supply Ability :200t/Year
Delivery Time :15 days
Packaging Details :Cylinder/Tank
Product Name :Tungsten Hexafluoride
Transport :By Sea
Purity :99.999%
Appearance :Colorless
Model No. :Tungsten Hexafluoride
Transport Package :Sea Transportation
Specification :10L/15kg
Trademark :CMC
Origin :Suzhou, China
HS Code :2804290000
CAS No. :7783-82-6
Formula :Wf6
EINECS :232-029-1
Constituent :Industrial Pure Air
Grade Standard :Industrial Grade
Chemical Property :Combustion-Supporting Gas
Customization :Available | Customized Request
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Product Description

Tungsten hexafluoride (WF6) is a chemical compound composed of one tungsten atom bonded to six fluorine atoms. It is a volatile, colorless gas at room temperature and atmospheric pressure. WF6 is known for its strong oxidizing properties and is primarily used in the semiconductor industry for chemical vapor deposition (CVD) processes.

Here are a few key points about tungsten hexafluoride gas:

  1. Chemical Formula: WF6
  2. Molecular Weight: 298.84 g/mol
  3. Physical Properties: Tungsten hexafluoride is a dense gas with a boiling point of about 17.1 °C (62.8 °F) and a melting point of -2.8 °C (27 °F). It is highly volatile and readily vaporizes into a gas.
  4. Reactivity: WF6 is a strong oxidizing agent and reacts violently with water, moisture, and most organic compounds. It can release highly corrosive hydrofluoric acid upon contact with water.
  5. Uses: The primary application of tungsten hexafluoride is in the semiconductor industry. It is used as a precursor in the deposition of tungsten films during the manufacturing of integrated circuits (ICs) and other electronic devices. WF6 reacts with hydrogen gas (H2) in a CVD process to deposit tungsten metal on the substrate.
  6. Safety Precautions: Tungsten hexafluoride is highly toxic and corrosive. It can cause severe burns and eye damage upon contact. Proper safety measures, including the use of protective equipment, should be employed when handling this gas.
  7. Environmental Impact: WF6 is not considered an ozone-depleting substance, but it is a potent greenhouse gas with a high global warming potential (GWP). Therefore, its release into the environment should be strictly controlled.

It's important to note that handling WF6 should be left to trained professionals in controlled laboratory or industrial settings due to its hazardous nature.

Basic Info.

Model NO. WF6 Transport Package Cylinder
Specification 10L/15kg Trademark CMC
Origin Suzhou, China HS Code 2812190091
Production Capacity 200t/Year
Product Spec:

Tungsten Hexafluoride WF6 GAS
CAS No.: 7783-82-6
EINECS No.: 232-029-1
UN No.: UN2196
Purity: 99.999%
Dot Class: 2.3
Appearance: Colorless
Grade Standard: Electron Grade,Industrial Grade

The COA of Product:
Test items Units Quality requirements Test results
CF4 ppm <0.5 <0.01
O2 ppm <0.5 <0.01
N2 ppm <1 0.03
CO ppm <0.5 <0.02
CO2 ppm <0.5 <0.01
SiF4 ppm <0.5 <0.1
SF6 ppm <0.5 <0.1
HF ppm <5 0.19
Al ppb ≤10 <0.020
As ppb ≤10 <0.001
B ppb ≤10 <0.005
Ca ppb ≤5 <0.200
Cd ppb ≤2 <0.001
Cr ppb ≤10 <0.020
Fe ppb ≤10 <0.007
K ppb ≤5 <0.100
Mn ppb ≤10 <0.001
Na ppb ≤5 <0.040
Th ppb ≤0.1 <0.001
Ti ppb ≤10 <0.002
Li ppb ≤10 <0.002
U ppb ≤0.05 <0.001
Zn ppb ≤10 <0.005
Si ppb ≤10 <0.100
Pb ppb ≤10 <0.001
P ppb ≤2 <0.300
Mg ppb ≤10 <0.020
Ni ppb ≤20 <0.030
Cu ppb ≤5 <0.005
Mo ppb ≤10 <0.001
Total impurities of other metal ppb ≤500 <0.0010

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Metal Organic Chemical Vapor Deposition (MOCVD) Cylinder Gas Tungsten Hexafluoride

Metal Organic Chemical Vapor Deposition (MOCVD) Cylinder Gas Tungsten Hexafluoride

Company Profile

Metal Organic Chemical Vapor Deposition (MOCVD) Cylinder Gas Tungsten Hexafluoride

Shanghai Kemike Chemical Co., Ltd is staffed by trained personnel, combine many years experience in Gas industry .We supply cylinder gas, electronic gas, etc ., and the gas holder, panel, valves and fittings and other equipment, parts and engineering services to our customers in China and worldwide; The products are involved in various industrial fields, such as semiconductor chip, solar cell, LED, TFT-LCD, optical fiber, glass, laser, medicine , etc., Our mission is to partner with our global customers to provide support, solutions and quality products that are innovative,reliable, and safe.
Our products mainly include: H2, O2, N2, Ar, CO2, propane, acetylene, helium, laser mixed gas, SiH4, Sih2cl2, SiHCL3, SiCL4, NH3, CF4, NF3, SF6, HCL, N2O, doping mixed gas (TMB, PH3, B2H6) and other electronic gases.
Metal Organic Chemical Vapor Deposition (MOCVD) Cylinder Gas Tungsten Hexafluoride
Metal Organic Chemical Vapor Deposition (MOCVD) Cylinder Gas Tungsten Hexafluoride
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